ALD IN VOLUME PRODUCTION FOR SEMICONDUCTORS
Multi-System Order From Major DRAM Manufacturer
Boosts ALD Market Momentum

SUNNYVALE, Calif.-December 4, 2002- One of the semiconductor capital equipment industry's fastest growing market segments, atomic layer deposition (ALD), moved forward today when Genus, Inc (Nasdaq: GGNS) announced that a leading DRAM manufacturer placed a multi-system order for its advanced deposition tools. The order, a combination of StrataGem ALD and LYNX chemical vapor deposition (CVD) systems in both 200 and 300 mm configurations, includes Genus' first ALD tool to go into semiconductor volume production.

"This result is in line with our belief that we would receive ALD volume production orders in this quarter for semiconductor DRAM manufacturing," stated Werner Rust, Genus' vice president of sales and marketing. "It is a major high volume production win and a validation of ALD as a proven technology. Additionally, it represents 100 percent conversion from the letters of intent to purchase orders, as predicted in Genus' recent third quarter conference call."

Leveraging its leadership window of opportunity over others in the ALD market, Genus has been building momentum at a proven pace during the past 18 months. The company has validated its technology leadership in the market with marathon testing, resulting in superior performance and positioning itself as the technology of choice for leading edge manufacturing. Prior to today's announcement, Genus has gained acceptance for production systems in the data storage industry and now takes that expertise into semiconductor volume production.

About Genus
Genus, Inc. manufactures critical deposition processing products for the global semiconductor industry and the data storage industry. To enable the production of intricate micro-computer chips and electronic storage devices, Genus offers its LYNX and StrataGem series production-proven equipment for 200mm and 300mm semiconductor production, and offers thin film deposition products for chemical vapor deposition (CVD), atomic layer deposition (ALD), and pre-clean capabilities. Genus is at the forefront of market and technology developments in the ALD marketplace, which is gaining acceptance worldwide as a critical technology for sub 0.13-micron production of computer chips and electronic storage devices. Genus' customers include semiconductor manufacturers located throughout the United States, Europe and the Pacific Rim including Korea, Japan and Taiwan. Founded in 1981, the company is headquartered in Sunnyvale, California. For additional information visit Genus' web site at www.genus.com

NOTE: LYNX2® and LYNX3™ are trademarks of Genus, Inc

Forward-Looking Statements
This press release contains forward-looking statements regarding the company's future financial and business performance. These forward-looking statements are subject to a number of risks and uncertainties. These contingencies include but are not limited to: actual customer orders received by the company, the extent to which ALD technology is demanded by the marketplace, the actual number of customer orders received by the company, availability of components from suppliers, the timing of final acceptance of products by customers, the financial climate, accessibility to financing and fulfillment of closing conditions, general conditions in the thin film equipment market and in the macro-economy, and the influence of global political events. Genus assumes no obligation to update this information. Additional risks and uncertainties are discussed in the Management's Discussion and Analysis of Results of Operations contained in Genus' Annual Report on Form 10-K for the fiscal year ended December 31, 2001 and subsequent quarterly reports on Form 10-Q filed with the Securities and Exchange Commission.