Genus Legacy Systems

A number of older Genus systems are still in the field being used for CVD processes. Genus still provides service and support to several customers with earlier Genus equipment.

Genus shipped its first cold wall LPCVD system to Intel in 1983. The product was called the 8301, which was a "batch" style LPCVD reactor used for the deposition of tungsten silicide (WSi_x) films. The gas delivery system and vacuum systems of this early system were enhanced to support the deposition of blanket tungsten films, and the system was re-introduced in 1984 as the 8402.

Genus released its next major CVD product to the market in 1987, as the 8710/8720. The 8700 series systems were also batch reactors used for the deposition of tungsten silicide and blanket tungsten films, but these systems included vacuum load locks and restively heated chuck assemblies (they were not lamp heated as were the 83/8400 series systems).

Finally in 1990, Genus introduced its final batch reactor, the 6000, which was based on the 8700 batch deposition chamber, but also included single-wafer plasma chambers capable of pre-clean and etchback applications.